旭昇科技
半導體設備翻修服務
AMAT CVD (Chemical Vapor Deposition, 化學氣相沉積)
01
Platform
- Producer GT
- Producer SE
- Producer S
- Producer
- Centura
- P5000
02
Chamber
- Twin chamber
- Ultima X
- Ultima+
- Ultima
- CxZ
- DxZ
- WxZ
03
Application
- HDPCVD
- PECVD
- SACVD
- WCVD
04
Wafer size
- 300mm
- 200mm
- 150mm
PVD (Physical Vapor Deposition, 物理氣相沉積)
01
Platform
- AMAT Endura
02
Application
- AlCu
- IMP
- TxZ
- TxZ+
- PCII
03
Wafer size
- 300mm
- 200mm
- 150mm
RTP (Rapid Thermal Processing, 快速升溫製程)
01
Application
- RTP
- HTF
- SiNgen
- EPI
02
Wafer size
- 300mm
- 200mm
AMAT ETCH (Etching, 蝕刻)
01
Platform
- Centura AP
- Centura 4.0
- Centura II
- Centura I
02
Chamber
- DPS II
- DPS
- Super E
- eMxP+
- MxP+
- MxP
- eMAX
03
Application
- Poly
- Metal
- Oxide etch
04
Wafer size
- 300mm
- 200mm
- 150mm
LAM ETCH
01
Platform
- Alliance A6
- Alliance A4
- Alliance 9400
- Alliance 9100
- Alliance 9600
02
Rainbow
- 4420
- 4520
- 4720
03
Wafer size
- 200mm
LAM (NOVELLUS) CVD (Chemical Vapor Deposition, 化學氣相沉積)
01
Platform
- Concept 1
- Concept 2
02
Chamber
- Vector
- Sequel express
- Sequel
- Speed
- Altus
03
Application
- HDPCVD
- PECVD
- WCVD
04
Wafer size
- 300mm
- 200mm